Atlant 3D Nanosystems

Atlant
*We developed μSADALP™ (Microreactor Selective Area Direct Atomic Layer Processing/Printing) patent-pending technology that provides highly conformal, direct material writing, and removal with atomic precision and material versatility.

Profile Description

ATLANT3DTM TECHNOLOGY
First ever on-demand atomic layer advanced manufacturing technology based on hybrid Microreactor Selective Area Direct Atomic Processing (μSADALP™)*

Redefining microfabrication
We enable on-demand next-generation microdevices printing on simple and complex surfaces atom-by-atom.

MEMS and Integrated Sensors, Microfluidics and Lab-on-Chip, RF-devices,  Optical and Photonic Devices, Quantum and Energy-Harvesting/Storage Devices can be developed with ATLANT3D™ technology with previously impossible functionality and speed at a fraction of a cost.

Unique ATLANT3D™ technology allows
– Rapid atomic layer prototyping and manufacturing
– Highly selective atomic layer patterning
– Excellent 2D/3D conformal deposition on simple and complex surfaces
– Combining multiple materials with excellent compatibility
– Excellent pattern adhesion to almost any surfaces
– Digital and atomically precise control over the printing process
– With possibility to apply up to 450 different commercially available materials

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